Sequential microcontroller-based control for a chemical vapor deposition process | Journal of Applied Research and Technology. JART

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Sequential microcontroller-based control for a chemical vapor deposition process

Edgar Serrano Péreza,

Corresponding author

kolben88@yahoo.de

Corresponding author.

, Javier Serrano Pérezb, Fernando Martínez Piñóna, José Manuel Juárez Garcíac, Omar Serrano Pérezd, Fernando Juárez Lópeza

a Instituto Politécnico Nacional, CIITEC, Cerrada de Cecati, Sta. Catarina, D.F. 02250, Mexico

b Universidad Tecnológica de Tecámac, Carretera Federal México – Pachuca, Km. 37.5, Predio Sierra Hermosa, C.P. 55740, Tecámac, Estado de Mexico, Mexico

c Centro Nacional de Metrología, Km 4.5 Carretera a Los Cués, C.P. 76246 Municipio El Marqués, Querétaro, Mexico

d Departamento de Posgrado, Instituto Politécnico Nacional, CIDETEC, Av. Juan de Dios Bátiz s/n, 07700 Ciudad de México, Mexico

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ISSN: 16656423
Original language: English

DOI:10.1016/j.jart.2017.07.003

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